Defect Engineering of Nanoscale Hf-Based Metal-Organic Frameworks for Highly Efficient Iodine Capture

xlomafota13 shared this article with you from Inoreader Defect Engineering of Nanoscale Hf-Based Metal-Organic Frameworks for Highly Efficient Iodine Capture Via radioactive iodine Inorg Chem. 2021 Jun 16. doi: 10.1021/acs.inorgchem.1c01120. Online ahead of print. ABSTRACT With the rapid development of the nuclear industry, how to deal with radioactive iodine waste in a timely and effective manner has become an important issue to be solved urgently. Herein, the defect-engineering strategy has been applied to develop a metal-organic framework (MOF)-based solid adsorbent by using the classical UiO-type Hf-UiO-66 as an example. After simple acid treatment, the p roduced defect-containing Hf-UiO-66 (DHUN) not only retains its topological structure, high crystallization, and regular shape but also shows a great increase in the Brunauer-Emmett-Teller value and pore size in comparison with the original Hf-UiO (HUN). These formed defects within DHUN have been demonstrated to be important for the great enhancement of the iodine capture and following application in computed tomography imaging in vitro. This present work gives a new insight into the control and formation of defect sites, and this simple and efficient defect-engineering strategy also shows great promise for the development of novel solid adsorbents and other functional MOF materials. PMID:34133146 | DOI:< a href="https://doi.org/10.1021/acs.inorgchem.1c01120" target="_blank" rel="noopener" class="underlink bluelink" tabindex="-1">10.1021/acs.inorgchem.1c01120 View on the web Inoreader. Take back control of your news feed. Follow us on Twitter and Facebook.